A new electron diffractometer with a diffraction-pattern scanning system in
front of a fixed counter has been developed. Significant improvement was a
chieved in the measured diffraction intensities by using fast electronics a
nd additional control of the stability of the electron beam. The measuremen
t of and accounting for the gear-frequency characteristic of the registrati
on system was performed, and the signal accumulation mode for intensity mea
surements together with advanced statistical data processing were employed.
Good agreement between the experimental and Hartree-Fock structure factors
for LiF, NaF and MgO was achieved (to avoid strong extinction effects, rat
her thin polycrystalline films were used as samples).