Piezoreflectance study of an Fe-containing silicon carbon nitride crystalline film

Authors
Hsieh, CH Huang, YS Tiong, KK Fan, CW Chen, YF Chen, LC Wu, JJ Chen, KH
Citation
Ch. Hsieh et al., Piezoreflectance study of an Fe-containing silicon carbon nitride crystalline film, J APPL PHYS, 87(1), 2000, pp. 280-284
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
87
Issue
1
Year of publication
2000
Pages
280 - 284
Database
ISI
SICI code
0021-8979(20000101)87:1<280:PSOAFS>2.0.ZU;2-2
Abstract
A detailed piezoreflectance (PzR) study of an Fe-containing silicon carbon nitride crystalline film in the temperature range between 15 and 580 K was performed. From the line shape fit of the PzR spectra, the impurity to band and the direct band-to-band transition energies which are denoted as E-i a nd E-g(d), respectively, at various temperatures were accurately determined . The parameters that describe the temperature dependence of E-i and E-g(d) are evaluated and discussed. (C) 2000 American Institute of Physics. [S002 1-8979(00)07001-8].