J. Kyokane et al., APPLICATION TO ELECTRONIC DEVICES USING ORGANIC THIN-FILMS BY ION-BEAM-EVAPORATION METHOD, Synthetic metals, 85(1-3), 1997, pp. 1393-1394
Among various methods for preparation of organic thin films, we propos
ed an ion implantation technique using positive ion beams of low energ
y under 50 similar to 100 eV. Tne Al electrolytic capacitor with charg
e transfer complex as solid electrolyte, the electroluminescent (EL) d
iode with double-layer structure (Mg:In/Alq(3)/TPD/ITO) and the solar
cell with Schottky junction or heterojunction of organic thin films we
re prepared by this method. The solid electrolytic capacitor with a go
od high frequency response of impedance was obtained to use the evapor
ated films. The light emission intensity and the life time of EL diode
s were higher and longer than that of the conventional thermal deposit
ion method. The conversion efficiency of the solar cells was 1.2% in t
he case of Schottky structure (Al/CuPc/ITO) with the phthalocyanine co
mpounds.