Measurements of thermal diffusivity of boron-silicon film-on-glass structure using phase detection method of photothermal deflection spectroscopy

Citation
Bx. Shi et al., Measurements of thermal diffusivity of boron-silicon film-on-glass structure using phase detection method of photothermal deflection spectroscopy, J MATER SCI, 34(21), 1999, pp. 5169-5173
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS SCIENCE
ISSN journal
00222461 → ACNP
Volume
34
Issue
21
Year of publication
1999
Pages
5169 - 5173
Database
ISI
SICI code
0022-2461(199911)34:21<5169:MOTDOB>2.0.ZU;2-B
Abstract
The phase detection method of photothermal deflection spectroscopy in the t ransverse configuration was used to measure the overall thermal diffusivity of silicon-boron (Si-B) alloy film on Corning 7059 glass substrate. Result s were attained by observing the phase of deflection of the probe beam when it scanned above the film surface relative to the pump beam. Measurements were repeated for different modulation frequencies of the pump beam. Furthe rmore, both bouncing and skimming configurations were used. The effect of v arying the distance between the probe beam and film surface was investigate d. (C) 1999 Kluwer Academic Publishers.