Dt. Hsu et al., Compatibility of the low-dielectric-constant poly(arylether) with the electroless copper deposition solution, J ELCHEM SO, 146(12), 1999, pp. 4565-4568
Possible interactions between nonfluorinated poly(arylether) thin films and
the recently developed electroless Cu deposition solution are investigated
. The results show that there is no chemical reaction between this low-diel
ectric-constant polymer and the electroless Cu deposition solution. However
, a significant change in thickness as well as refractive index is induced
by the electroless solution conditions. It is demonstrated that higher temp
eratures can alleviate the electroless Cu solution-induced effects as far a
s the glass transition temperature, the coefficient of thermal expansion, a
nd refractive index are concerned. (C) 1999 The Electrochemical Society. S0
013-4651(98)08-032-X. All rights reserved.