Y. Okamoto et al., Thermoelectric properties of silicon and nickel double doped silicon carbide based sintered, J JPN METAL, 63(11), 1999, pp. 1443-1447
Thermoelectric properties and electrical transport parameters of the Si and
Ni co-doped SiC have been studied as functions of both Si and Ni doping co
ncentration and temperature. It is intended to increase the figure of merit
easily by addition of isoelectric element Si and transition metal element
Ni. The samples were fabricated by conventional wet mixing and powder sinte
ring process. Measurements of electrical resistivity and thermoelectric pow
er were made in the temperature range from room temperature to around 1000
K in He atmosphere. Thermal conductivity were measured in the temperature r
ange from room temperature to around 600 K in air. Measurements of Hall coe
fficient, X-ray crystallography and EPMA were also made. The thermoelectric
power increases drastically by addition of Si and Ni. The maximum value of
thermoelectric power reached to about 600 mu V. Thermal conductivity reach
ed to the minimum value of 8.0 W / (mK) at 40.0 mass% of Si concentration a
nd 1.0 mass% of Ni concentration. Enhancement of the figure of merit Z was
achieved by co-doping of Si and Ni. The figure of merit Z reached to the ma
ximum value of 2.5 x 10(-4) K-1.