Study of dopant-dependent band gap narrowing in compound semiconductor devices

Citation
V. Palankovski et al., Study of dopant-dependent band gap narrowing in compound semiconductor devices, MAT SCI E B, 66(1-3), 1999, pp. 46-49
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
66
Issue
1-3
Year of publication
1999
Pages
46 - 49
Database
ISI
SICI code
0921-5107(199912)66:1-3<46:SODBGN>2.0.ZU;2-E
Abstract
Band gap narrowing (BGN) is one of the crucial heavy-doping effects to be c onsidered for bipolar devices. Using a physically-based approach (E.F. Schu bert, Doping in III-V Semiconductors, Cambridge University Press, 1993), we suggest a new BGN model which considers the semiconductor material and the dopant species for arbitrary finite temperatures. This unified treatment i s especially useful for accurate device simulation. A comparison with exper imental data and other existing models is presented and study of BGN in III -V group semiconductors is performed. Finally, as a particular example we i nvestigated with our two-dimensional device simulator MINIMOS-NT (Simlinger et al., Simulation of submicron double-heterojunction high electron mobili ty transistors with MINIMOS-NT, IEEE Trans. Electron. Devices, Vol. 44, 199 7, pp. 700-707), the electrical behavior of a graded composition Si/SiGe HB T using a hydrodynamic transport model. (C) 1999 Elsevier Science S.A. All rights reserved.