A self-assembled monolayer has been fabricated by assembling (2, 2': 5', 2"
-terthiophene)5-carboxylic acid (TTPCA) on a n-Si wafer (111). The formatio
n of the self-assembled film (TTPCp/n-Si) was characterized by advancing co
ntact angle, X-ray photoelectron spectroscopy (XPS) and atomic force micros
copy (AFM). The firm possesses a higher SPV response.