Optical and structural characterization of Ga(In)N three-dimensional nanostructures grown by plasma-assisted molecular beam epitaxy

Citation
G. Pozina et al., Optical and structural characterization of Ga(In)N three-dimensional nanostructures grown by plasma-assisted molecular beam epitaxy, PHYS ST S-B, 216(1), 1999, pp. 445-450
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA STATUS SOLIDI B-BASIC RESEARCH
ISSN journal
03701972 → ACNP
Volume
216
Issue
1
Year of publication
1999
Pages
445 - 450
Database
ISI
SICI code
0370-1972(199911)216:1<445:OASCOG>2.0.ZU;2-N
Abstract
We report on structural and optical properties of self-assembling GaN and I nN three-dimensional (3D) nanostructures grown by a vapor-liquid-solid mech anism on GaAs(311) and Al2O3(0001) substrates. Characterization was done us ing scanning electron microscopy (SEM), time-resolved photoluminescence (PL ) and cathodoluminescence (CL). SEM analysis has shown that the GaN 3D nano structures grow up in the shape of nano-columns regularly distributed on th e planar GaN layer surface, while the 3D InN nanostructures form more compl ex inverted cones. Luminescence spectra of the GaN 3D nano-columns are domi nated by the emissions at 3.46 and 3.26 eV related to donor-bound-exciton a nd donor-acceptor pair recombination, respectively. CL measurements have re vealed two emission lines at 2.4 and 2.2 eV originated from the InN 3D nano structures.