Potential-controlled step flow to 3D step decoration transition: Ni electrodeposition on Ag(111)

Citation
S. Morin et al., Potential-controlled step flow to 3D step decoration transition: Ni electrodeposition on Ag(111), PHYS REV L, 83(24), 1999, pp. 5066-5069
Citations number
17
Categorie Soggetti
Physics
Journal title
PHYSICAL REVIEW LETTERS
ISSN journal
00319007 → ACNP
Volume
83
Issue
24
Year of publication
1999
Pages
5066 - 5069
Database
ISI
SICI code
0031-9007(199912)83:24<5066:PSFT3S>2.0.ZU;2-I
Abstract
A novel growth effect, the potential-controlled transition from 2D step-few growth (-0.69 V-Ag/AgCl) to (i) selective growth of 3D admetal islands at substrate steps (-0.73 V) and (ii) 3D island growth on-steps and substrate terraces (-0.85 V), is demonstrated for Ni electrodeposition on Ag(lll). Th e nucleation and growth process apparently proceeds via direct deposition f rom the solution at step sites and can be rationalized by a kinetically con trolled multilayer growth process, where the higher layer nucleation rate i ncreases more with overpotential than does the 2D growth rate.