Passivation of trap states in polycrystalline Si by cyanide treatments

Citation
E. Kanazaki et al., Passivation of trap states in polycrystalline Si by cyanide treatments, SOL ST COMM, 113(4), 1999, pp. 195-199
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SOLID STATE COMMUNICATIONS
ISSN journal
00381098 → ACNP
Volume
113
Issue
4
Year of publication
1999
Pages
195 - 199
Database
ISI
SICI code
0038-1098(1999)113:4<195:POTSIP>2.0.ZU;2-S
Abstract
The cyanide treatment in which polycrystalline Si is immersed in a KCN solu tion followed by rinsing in boiling water increases the energy conversion e fficiency of [ITO/silicon oxide/polycrystalline Si] junction solar cells to 12.5%. The XPS measurements under bias show that the trap density in polyc rystalline Si is markedly decreased by the cyanide treatment, especially th e decrease near the Fermi level being remarkable. The dark current density for the cells without the cyanide treatment depends only weakly on the temp erature, indicating that tunneling is a dominant mechanism for the current how through the Si depletion layer. The cyanide treatment increases the tem perature-dependence markedly, showing that thermal excitation of majority c arriers becomes necessary for the current flow due to the elimination of th e trap states in the Si depletion layer. (C) 1999 Elsevier Science Ltd. All rights reserved.