Focus drilling and attenuated phase shift mask for subwavelength contact window printing using positive and negative resists

Authors
Pau, S Trimble, LE Blatchford, JW Watson, GP Frackoviak, J Cirelli, R Nalamasu, O
Citation
S. Pau et al., Focus drilling and attenuated phase shift mask for subwavelength contact window printing using positive and negative resists, J VAC SCI B, 17(6), 1999, pp. 2499-2506
Citations number
5
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
17
Issue
6
Year of publication
1999
Pages
2499 - 2506
Database
ISI
SICI code
1071-1023(199911/12)17:6<2499:FDAAPS>2.0.ZU;2-C
Abstract
We have investigated the process latitude and resolution limit of printing contact windows using a high numerical aperture KrF stepper and attenuated phase shift mask (APSM). We show that both positive and negative resists ca n be used depending on the size of the window on the mask. The advantages a nd disadvantages of using the positive and negative resists are presented. A combination of APSM and focus drilling are shown to extend the focus lati tude of subwavelength window printing. (C) 1999 American Vacuum Society. [S 0734-211X(99)15706-8].