Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography

Submicron patterning of 1 in. diameter curved Surfaces with a 46 mm radius of curvature has been demonstrated with step and flash imprint lithography (SLIL) using templates patterned by ion beam proximity printing (IBP). Conc ave and convex spherical quartz templates were coated with 700-nm-thick pol y(methylmethacrylate) (PMMA) and patterned by step-and-repeat IBP. The deve loped resist features were etched into the quartz template and the remainin g PMMA stripped. During SFIL, a low viscosity, photopolymerizable formulati on containing organosilicon precursors was introduced into the gap between the etched template and a substrate coated with an organic transfer layer a nd exposed to ultraviolet illumination. The smallest features on the templa tes were faithfully replicated in the silylated layer. (C) 1999 American Va cuum Society. [S0734-211X(99)11006-0].