A new resolution enhancement technique for photolithography that allows the
illumination of each and every feature on a reticle to be customized is de
scribed. Customization is important because different feature types, e.g.,
contact holes, isolated lines, dense gratings, etc., must be illuminated di
fferently if the best possible image at the largest depth-of-focus is to be
produced. Examples of the imaging performance of a conventional lithograph
ic projector retrofitted with dark-field illumination for three feature typ
es commonly encountered in semiconductor lithography are presented. (C) 199
9 American Vacuum Society. [S0734-211X(99)07806-3].