Nanofabrication with deep-ultraviolet lithography and resolution enhancements

Authors
Fritze, M Palmateer, S Maki, P Knecht, J Chen, CK Astolfi, D Cann, S Denault, S Krohn, K Wyatt, PW
Citation
M. Fritze et al., Nanofabrication with deep-ultraviolet lithography and resolution enhancements, J VAC SCI B, 17(6), 1999, pp. 3310-3313
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
17
Issue
6
Year of publication
1999
Pages
3310 - 3313
Database
ISI
SICI code
1071-1023(199911/12)17:6<3310:NWDLAR>2.0.ZU;2-Y
Abstract
This work explores the nanofabrication potential of resolution-enhanced dee p-ultraviolet lithography. We combine strong phase-shift methods with fabri cation-based enhancements to produce silicon structures in the deep sub-100 nm regime; Limits on resolution and pitch with these methods are considere d. (C) 1999 American Vacuum Society. [S0734-211X(99)19706-3].