Maskless, parallel patterning with zone-plate array lithography

Zone-plate array lithography (ZPAL) is a maskless lithography scheme that u ses an array of shuttered zone plates to print arbitrary patterns on a subs trate. An experimental ultraviolet ZPAL system has been constructed and use d to simultaneously expose nine different patterns with a 3X3 array of zone plates in a quasidot-matrix fashion. We present exposed patterns, describe the system design and construction, and discuss issues essential to a func tional ZPAL system. We also discuss another ZPAL system which operates with 4.5 nm x radiation from a point source. We present simulations which show that, with our existing x-ray zone plates and this system, we should be abl e to achieve 55 nm resolution. (C) 1999 American Vacuum Society. [S0734-211 X(99)03906-2].