Bipolar model extension for MOS transistors considering gate coupling effects in the HEM ESD domain

Citation
H. Wolf et al., Bipolar model extension for MOS transistors considering gate coupling effects in the HEM ESD domain, MICROEL REL, 39(11), 1999, pp. 1541-1549
Citations number
21
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONICS RELIABILITY
ISSN journal
00262714 → ACNP
Volume
39
Issue
11
Year of publication
1999
Pages
1541 - 1549
Database
ISI
SICI code
0026-2714(199911)39:11<1541:BMEFMT>2.0.ZU;2-0
Abstract
The presented compact model for NMOS transistors combines both the high-cur rent bipolar mode and the MOS mode considering modulation of the current ga in beta and gate coupling effects. For the studied 0.35 mu m-CMOS devices, measurement and simulation correlate very well with respect to layout varia tions, fulfilling a prerequisite for the simulation guided synthesis and op timization of ESD protection structures and schemes. The open model interfa ce also allows the use of existing proprietary MOS-models. (C) 1999 Elsevie r Science Ltd. All rights reserved.