Modeling electromigration as a fluid-gas system

Citation
W. Schoenmaker et V. Petrescu, Modeling electromigration as a fluid-gas system, MICROEL REL, 39(11), 1999, pp. 1667-1676
Citations number
10
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONICS RELIABILITY
ISSN journal
00262714 → ACNP
Volume
39
Issue
11
Year of publication
1999
Pages
1667 - 1676
Database
ISI
SICI code
0026-2714(199911)39:11<1667:MEAAFS>2.0.ZU;2-T
Abstract
In this paper two problems in modeling electromigration are addressed. The first problem is an issue of principle concerning counting the number of va riables and the number of equations for formulating a well-posed mathematic al problem. The second problem deals with setting up a system of equations which are sufficiently detailed for performing computer simulations of the local dynamics governing electromigration phenomena, and which also keep th e CPU consumption within acceptable limits. A model for electromigration, w hich is based on a fluid-gas picture for the material transport, is propose d for dealing with bath questions. The flow of matter is described as a com bined flow of lattice sites and a flow of vacancies. The gas component is u sed to describe the vacancy flux. (C) 1999 Elsevier Science Ltd. All rights reserved.