Growth of rutile TiO2 thin films by laser ablation

Thin films of TiO2 on glass substrates were grown by the laser ablation tec hnique using the second harmonic (532 nm) of a pulsed Nd-YAG laser as the e vaporation source. During deposition various substrate temperatures and oxy gen pressures were used to optimise the growth of rutile TiO2 thin films. R aman spectroscopy and X-ray diffraction measurements showed that crystallin e thin films were obtained at a substrate temperature as low as 100 degrees C. The films show smooth surface morphology and good adhesion.