Thin films of TiO2 on glass substrates were grown by the laser ablation tec
hnique using the second harmonic (532 nm) of a pulsed Nd-YAG laser as the e
vaporation source. During deposition various substrate temperatures and oxy
gen pressures were used to optimise the growth of rutile TiO2 thin films. R
aman spectroscopy and X-ray diffraction measurements showed that crystallin
e thin films were obtained at a substrate temperature as low as 100 degrees
C. The films show smooth surface morphology and good adhesion.