Valence band structure and decay process in the inner-shell excitation of boron oxide

Citation
Y. Muramatsu et al., Valence band structure and decay process in the inner-shell excitation of boron oxide, X-RAY SPECT, 28(6), 1999, pp. 503-508
Citations number
16
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences
Journal title
X-RAY SPECTROMETRY
ISSN journal
00498246 → ACNP
Volume
28
Issue
6
Year of publication
1999
Pages
503 - 508
Database
ISI
SICI code
0049-8246(199911/12)28:6<503:VBSADP>2.0.ZU;2-A
Abstract
The electronic structure and radiative/non-radiative decay processes in the inner-shell excitation of B2O3 were investigated using soft x-ray emission and photoelectron spectroscopy. Based on density of states calculations, t he electronic structure of B2O3 as probed by m-ray emission spectroscopy (X ES) and photoelectron spectroscopy (PES) arises from hybridized sp(2)-plana r B-O bonding in B-Os triangular units. A fairly nondispersive band structu re was also suggested by excitation energy-dependent XES. XES and PES indic ated both a resonant radiative decay process and a resonant non-radiative d ecay process with pi* excitation at the B K threshold. A small resonant rad iative decay peak was observed with pi* excitation at the O K K threshold, probably due to a more weakly bound pi* state at the O K threshold than at the B K threshold. Copyright O 1999 John Wiley & Sons, Ltd.