Total reflection x-ray photoelectron spectroscopy of a tantalum-titanium multilayer

X-ray photoelectron spectra of two Ta-Ti bilayers on a Si wafer are measure d using a soft x-ray synchrotron radiation beamline at the Photon Factory. The grazing incident x-rays are used to excite photoelectrons. The photoele ctron intensity dependence is measured as the change in the glancing angle of the incident x-rays, A change in the angular dependence of photoelectron intensity and a chemical shift are observed with change in thermal treatme nt of the multilayer sample. Copyright (C) 1999 John Wiley & Sons, Ltd.