Patterned polymer growth on silicon surfaces using microcontact printing and surface-initiated polymerization

Patterned polymer films were grown on SiO2/Si surfaces by a process startin g with microcontact printing (mu CP) of octadecyltrichlorosilane (OTS), for mation of a monolayer derived from norbornenyl trichlorosilane (Nbn-SiCl3) in areas not protected by OTS, activation of the surfaces derived from Nbn- SiCl3 with a ruthenium catalyst, and surface-initiated ring-opening metathe sis polymerization of derivatives of norbornene by the catalytically active ruthenium species. These patterned polymer films were successfully used as reactive ion etching resists. The combination of mu CP and surface-initiat ed polymerization makes possible molecular-level control of polymer composi tion and thickness in both lateral and vertical directions: the smallest pa tterned lateral features were 2 mu m lines; this width was determined by th e features of the stamp used in mu CP and is not the intrinsic limit of the method. The thickness of the polymer film was, typically, 5-100 nm and cou ld be controlled by monomer concentration and reaction time. (C) 1999 Ameri can Institute of Physics. [S0003-6951(99)01052-9].