K. Kassmi et al., Ionizing irradiation effect on the current-voltage characteristics of the metal/ultra-thin oxide/semiconductor structures, EPJ-APPL PH, 8(2), 1999, pp. 171-178
In this paper, we analyse the ionizing irradiation influence on the charact
eristic current-voltage (V < 0 and V > 0) of the metal/ultra-thin oxide/sem
iconductor structures where the oxide thickness varies from 40 to 125 Angst
rom. The results obtained show that this influence is significant on the cu
rrent corresponding to the carrier injection by the semiconductor (V > 0).
When the thickness of oxide is higher than 100 Angstrom, the radiation crea
tes a positive charge in the oxide and decreases the conduction parameters
(K-1 and K-2) For oxide thicknesses lower than 100 Angstrom, the radiation
does not create any charge in the oxide but improves the conduction paramet
ers. This is attributed to the beneficial effect of the radiation on the de
fects characterizing an ultra-thin oxide layer.