DEFECT CHEMISTRY OF ANTIMONY DOPED SNO2 THIN-FILMS .2. ELECTRICAL-PROPERTIES

Citation
M. Rekas et Z. Szklarski, DEFECT CHEMISTRY OF ANTIMONY DOPED SNO2 THIN-FILMS .2. ELECTRICAL-PROPERTIES, Bulletin of the Polish Academy of Sciences. Chemistry, 44(3), 1996, pp. 163-177
Citations number
48
Categorie Soggetti
Chemistry
ISSN journal
02397285
Volume
44
Issue
3
Year of publication
1996
Pages
163 - 177
Database
ISI
SICI code
0239-7285(1996)44:3<163:DCOADS>2.0.ZU;2-E
Abstract
Electrical properties as well as defect chemistry of antimony doped Sn O2 thin films deposited by rf reactive co-sputtering method were studi ed. The measurements of both de and ac electric conductivity, Hall eff ect; work function of electrons using Kelvin-Zinsmann method were carr ied out. These studies proved that for concentration above 2.5 at % Sb , the interaction thin film-oxygen may be interpreted in terms of the bulk defect chemistry. For lower concentration of Sb the surface-traps -limited conductivity is possible.