Calculation of emissivity of Si wafers

Citation
B. Sopori et al., Calculation of emissivity of Si wafers, J ELEC MAT, 28(12), 1999, pp. 1385-1389
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF ELECTRONIC MATERIALS
ISSN journal
03615235 → ACNP
Volume
28
Issue
12
Year of publication
1999
Pages
1385 - 1389
Database
ISI
SICI code
0361-5235(199912)28:12<1385:COEOSW>2.0.ZU;2-0
Abstract
A computer-software, EMISSIVITY, has been developed to calculate the emissi vity (epsilon) of silicon wafers of any surface morphology, for a given tem perature and dopant concentration. The software uses a combination of ray- and wave-optics approaches to include the interference and the polarization effects necessary for multilayer surface coatings and multi-reflections wi thin thin wafers. The refractive index and the absorption coefficient are c alculated as a function of temperature and dopant concentration using an em pirical model for an indirect bandgap semiconductor. The results of this mo del are compared with conventional emissivity calculations and experimental data.