A computer-software, EMISSIVITY, has been developed to calculate the emissi
vity (epsilon) of silicon wafers of any surface morphology, for a given tem
perature and dopant concentration. The software uses a combination of ray-
and wave-optics approaches to include the interference and the polarization
effects necessary for multilayer surface coatings and multi-reflections wi
thin thin wafers. The refractive index and the absorption coefficient are c
alculated as a function of temperature and dopant concentration using an em
pirical model for an indirect bandgap semiconductor. The results of this mo
del are compared with conventional emissivity calculations and experimental
data.