A study of the effect of ultraviolet (UV) and vacuum ultraviolet (VUV) photons on the minority carrier lifetime of single crystal silicon processed by rapid thermal and rapid photothermal processing

Citation
S. Venkataraman et al., A study of the effect of ultraviolet (UV) and vacuum ultraviolet (VUV) photons on the minority carrier lifetime of single crystal silicon processed by rapid thermal and rapid photothermal processing, J ELEC MAT, 28(12), 1999, pp. 1394-1398
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF ELECTRONIC MATERIALS
ISSN journal
03615235 → ACNP
Volume
28
Issue
12
Year of publication
1999
Pages
1394 - 1398
Database
ISI
SICI code
0361-5235(199912)28:12<1394:ASOTEO>2.0.ZU;2-1
Abstract
Minority carrier Lifetime is an efficient indicator of defect levels presen t in the starting material as well as process and equipment induced defects . By employing rapid thermal processing (RTP) and rapid photothermal proces sing (RPP) as the thermal processing techniques, we have studied the effect of ultraviolet (UV) and vacuum ultraviolet (VUV) photons on the bulk minor ity carrier lifetime of phosphorous doped and undoped single crystal silico n wafers. For both diffused and undiffused wafers, we have observed an enha ncement in the minority carrier Lifetime when UV and VUV photons are used i n conjunction with the samples processed without the use of UV and VUV phot ons. The effect of ramp rates on the minority carrier Lifetime and the sign ificance of optimized thermal cycles have also been studied in this paper. A possible explanation based on the dependence of diffusion coefficient on the photo spectrum of light source is also given in this paper.