Oxygen diffusion in epitaxial Bi2Sr2CaCu2O8+delta thin films

Citation
T. Zahner et al., Oxygen diffusion in epitaxial Bi2Sr2CaCu2O8+delta thin films, J L TEMP PH, 117(3-4), 1999, pp. 651-655
Citations number
7
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF LOW TEMPERATURE PHYSICS
ISSN journal
00222291 → ACNP
Volume
117
Issue
3-4
Year of publication
1999
Pages
651 - 655
Database
ISI
SICI code
0022-2291(199911)117:3-4<651:ODIEBT>2.0.ZU;2-P
Abstract
Superconducting Bi2Sr2 CaCu2O8+delta thin films (T-c similar or equal to 85 K) were prepared on off-c-axis (001) SrTiO3 substrates by pulsed laser dep osition. High quality oriented film growth with a c-axis inclined with resp ect to the surface normal by a tilt angle alpha is found vp to alpha simila r or equal to 15 degrees from SEM, XRD and resistivity measurements. Isothe rmal oxygen diffusion is monitored by in-situ electrical resistance measure ments at temperatures ranging from 200 degrees C...400 degrees C. From the temporal evolution of the resistance the "in-plane" diffusion constant D-ab is determined.