Tantalum oxide films prepared by unbalanced reactive magnetron sputtering

Citation
Nr. Rao et al., Tantalum oxide films prepared by unbalanced reactive magnetron sputtering, J MAT SCI L, 18(23), 1999, pp. 1949-1951
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS SCIENCE LETTERS
ISSN journal
02618028 → ACNP
Volume
18
Issue
23
Year of publication
1999
Pages
1949 - 1951
Database
ISI
SICI code
0261-8028(199912)18:23<1949:TOFPBU>2.0.ZU;2-#