An Au/Si3N4 interface was obtained by vapor deposition of Au on a Si3N4 sub
strate in vacuum, both at room temperature and 600 degrees C. The interface
structure and chemical composition were investigated by high resolution an
d analytical electron microscopy. A damaged phase was observed between Au a
nd Si3N4 crystals. The thickness of this phase increased when the substrate
surface was polished or the substrate was heated. This phase was found to
be amorphous and merely composed of Si and N.