Characterization of ferroelectric SBT thin films prepared by sol-gel process

Citation
Hh. Jang et al., Characterization of ferroelectric SBT thin films prepared by sol-gel process, J KOR PHYS, 35, 1999, pp. S1223-S1226
Citations number
8
Categorie Soggetti
Physics
Journal title
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
ISSN journal
03744884 → ACNP
Volume
35
Year of publication
1999
Supplement
S
Pages
S1223 - S1226
Database
ISI
SICI code
0374-4884(199912)35:<S1223:COFSTF>2.0.ZU;2-Q
Abstract
Ferroelectric Sr1-xBi2+xTa2O9 (0 less than or equal to x less than or equal to 0.3) solutions were synthesized using sol-gel process in which alkoxide precursors were used as starting materials. Thin films were coated on Pt/T i/SiO2/Si substrates by spin-coating. Rapid thermal annealing (RTA) was use d to promote crystallization. Thin films were annealed in oxygen atmosphere . Pt top-electrode was deposited by sputtering and thin films were post-ann ealed to enhance electrical properties. Fluorite phase transformed to layer ed perovskite phase with annealing temperatures up to 700 degrees C. Desira ble dielectric property was obtained at composition of Sr0.9Bi2.1Ta2O9. As the RTA temperature increase, the higher 2Pr values were obtained. At RTA t emperature being 780 degrees C remanent polarization value of Sr0.9Bi2.1Ta2 O9 thin film was 7.73 mu C/cm(2) and leakage current density value was 1.14 x 10(-7) A/cm(2) at 3 V.