Tin oxide thin film was epitaxially grown on sapphire (0001) by magnetron s
puttering deposition. From x-ray diffraction, it is compared with the resul
ts of transmission electron microscopy (D. Liu, et al., J. Mater. Res. 10,
1516 (1995)) that tin oxide thin film has variant structure with three-fold
symmetries on sapphire substrate. Also, informations of top surface, of su
rface morphology and surface hight profile, are obtained by atomic force mi
croscopy. Some parameters of interfaces, of thickness of thin film and roug
hness of interfaces are determined by synchrotron x-ray reflectivity.