Growth of ferroelectric SbNbO4 thin film by chemical solution deposition method

Citation
J. Kim et al., Growth of ferroelectric SbNbO4 thin film by chemical solution deposition method, J KOR PHYS, 35, 1999, pp. S1256-S1259
Citations number
8
Categorie Soggetti
Physics
Journal title
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
ISSN journal
03744884 → ACNP
Volume
35
Year of publication
1999
Supplement
S
Pages
S1256 - S1259
Database
ISI
SICI code
0374-4884(199912)35:<S1256:GOFSTF>2.0.ZU;2-A
Abstract
The stibiotantalite SbNbO4 thin films were grown on Si substrate using the chemical solution deposition method. SbNbO4 phase with highly b-axis prefer red orientation could be obtained from the as-deposoted film by rapid therm al processing at above 700 degrees C in N-2 atmosphere. Though evidently re duced by further heat treatment of conventional furnace annealing at 700 de grees C in N-2 atmosphere, small amount of the second phase in the film was not fully disappeared. Pole-figure measurement showed that the Ib-axis of the film was not exactly normal to the substrate but tilted at about 5 degr ees. From P-V hysteresis measurement the remnant polarization was estimated to be 5 mu C/cm(2), but the hysteresis loop of the film revealed very loss y behavior which might be originated mainly from the second phases in the f ilm.