We demonstrate that non-oxide (II-VI type semiconductors) ferroelectric thi
n films on Si(100), such as (Zn,Cd)Te, (Zn,Cd)Se and (Zn,Cd)S, have ferroel
ectric properties. Furthermore, thin films of (LixZn1-x)O, which is also a
II-VI type semiconductor, display ferroelectric hysteretic features with me
mory windows of between 0.2 V and 0.5 V corresponding to the value of x. Th
e material design for producing the ferroelectric nature is done by replaci
ng some of the host atoms with other smaller atoms. The substituted atoms c
an occupy off-center positions, thus locally inducing electric dipoles, the
reby leading to ferroelectric behavior. These II-VI wide gap semiconducting
ferroelectric films will open the door to new memory devices.