3-DIMENSIONAL NUMERICAL-MODEL FOR THERMAL-ANALYSIS IN X-RAY-IRRADIATED PHOTORESISTS

Three-dimensional X-my irradiated resist has been modeled numerically, based on the Douglas alternating direction implicit (ADI) scheme and the parallel ''divide and conquer'' technique, in order to analyze the temperature distribution and the potential temperature rise. This num erical procedure is simple and efficient and can be generalized to the multilayer case, since it converts three-dimensional computations int o a sequence of one-dimensional computations and easily overcomes the unknown at the interface between layers. Furthermore, the computationa l procedure is a domain decomposition algorithm. Numerical results wer e obtained with regard to the temperature distribution and maximum tem perature rise attained in the resist.