W. Dai et al., 3-DIMENSIONAL NUMERICAL-MODEL FOR THERMAL-ANALYSIS IN X-RAY-IRRADIATED PHOTORESISTS, Numerical heat transfer. Part A, Applications, 31(6), 1997, pp. 585-595
Three-dimensional X-my irradiated resist has been modeled numerically,
based on the Douglas alternating direction implicit (ADI) scheme and
the parallel ''divide and conquer'' technique, in order to analyze the
temperature distribution and the potential temperature rise. This num
erical procedure is simple and efficient and can be generalized to the
multilayer case, since it converts three-dimensional computations int
o a sequence of one-dimensional computations and easily overcomes the
unknown at the interface between layers. Furthermore, the computationa
l procedure is a domain decomposition algorithm. Numerical results wer
e obtained with regard to the temperature distribution and maximum tem
perature rise attained in the resist.