The temperature dependence of radiative and nonradiative processes at Er-Ocenters in Si

Citation
Td. Chen et al., The temperature dependence of radiative and nonradiative processes at Er-Ocenters in Si, PHYSICA B, 274, 1999, pp. 322-325
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA B
ISSN journal
09214526 → ACNP
Volume
274
Year of publication
1999
Pages
322 - 325
Database
ISI
SICI code
0921-4526(199912)274:<322:TTDORA>2.0.ZU;2-7
Abstract
Er-doped silicon is a promising material for silicon microphotonics light s ources. Luminescence from Er-O centers in silicon exhibits an intensity que nching as the temperature is raised from 4 to 300K. We present the first un ified description of the excitation and de-excitation processes over the en tire temperature range. We model the phenomena in terms of exciton Auger, i mpurity Auger, and multiphonon transition processes. A set of rate equation s that includes all of these processes is written to describe the energy tr ansfer, and the normalized luminescence intensity versus temperature is com puted and compared to experimental data. The proposed model fits the experi mental photoluminescence data over the entire temperature range. Junction p hotocurrent spectroscopy measurements confirm the presence of a non-radiati ve multiphonon backtransfer mechanism. The photocurrent generated from the direct optical excitation of Er centers was found to increase with temperat ure in the form expected from the energy backtransfer model. (C) 1999 Elsev ier Science B.V. All rights reserved.