On the generation of optically active Er centers in Si light emitting diodes

Citation
W. Jantsch et al., On the generation of optically active Er centers in Si light emitting diodes, PHYSICA B, 274, 1999, pp. 330-333
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA B
ISSN journal
09214526 → ACNP
Volume
274
Year of publication
1999
Pages
330 - 333
Database
ISI
SICI code
0921-4526(199912)274:<330:OTGOOA>2.0.ZU;2-B
Abstract
Room-temperature electroluminescence is obtained from erbium-doped Si diode s for heavily Er- and oxygen-doped material. Such diodes exhibit under reve rse bias excitation a characteristic, about 10-20 nm wide emission spectrum which has a striking similarity to erbium-implanted silica (SiO2 : Er) in contrast to the sharp line spectra of isolated Er centers seen at lower tem peratures. The wide spectrum is thus attributed to the inhomogeneously broa dened emission from Er in amorphous SiO2-delta precipitates. We show that t he isolated centers can be transformed into Er-containing precipitates for sufficient Er- and O-doses by proper choice of the annealing temperature af ter implantation. (C) 1999 Elsevier Science B.V. All rights reserved.