Influence of stoichiometry and doping on vacancies in n-type GaAs

Citation
J. Gebauer et al., Influence of stoichiometry and doping on vacancies in n-type GaAs, PHYSICA B, 274, 1999, pp. 705-709
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA B
ISSN journal
09214526 → ACNP
Volume
274
Year of publication
1999
Pages
705 - 709
Database
ISI
SICI code
0921-4526(199912)274:<705:IOSADO>2.0.ZU;2-V
Abstract
Native vacancies in n-type, Te-doped GaAs (n = 5 x 10(16)-5 x 10(18) cm(-3) ) were studied by means of positron annihilation. We investigated the influ ence of doping, thermal treatment, and stoichiometry adjusted by changing t he As pressure during annealing. Negatively charged monovacancies were foun d in all Te-doped samples under investigation. By using positron lifetime s pectroscopy in conjunction with measurements of the annihilation momentum d istribution and theoretical calculations, they can directly be identified t o be V-Ga-Te-As complexes. After thermal treatment at 1100 degrees C the de nsity of the vacancies c(v) increases with the As pressure (p(As)) like c(v ) = 0.1C(d)p(As)(1/4) where c(d) is the donor concentration. For such a tre atment, c(v) depends only on p(As) but not on the thermal history. The vaca ncy concentration was found to increase slightly with decreasing annealing temperature at a given p(As). This can be explained by the so-called Fermi level effect, i.e. the dependence of the equilibrium concentration of charg ed point defects on the position of the Fermi level. (C) 1999 Elsevier Scie nce B.V. All rights reserved.