Defect-limited carrier diffusion in In0.53Ga0.47As-InP single quantum well

Citation
Afg. Monte et al., Defect-limited carrier diffusion in In0.53Ga0.47As-InP single quantum well, PHYSICA B, 274, 1999, pp. 963-966
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA B
ISSN journal
09214526 → ACNP
Volume
274
Year of publication
1999
Pages
963 - 966
Database
ISI
SICI code
0921-4526(199912)274:<963:DCDIIS>2.0.ZU;2-S
Abstract
The diffusion of electron-hole plasma in an intrinsic In0.53Ga0.47As single quantum well (SQW) was investigated by measurements of the PL intensity pr ofile around the illuminated area. We found that the carrier diffusion leng th increases with the temperature, from 85 to 300 K, according to a defect- limited carrier diffusion. A change in the carrier expansion is observed at about 200 K, which appears to be correlated with the thermal activation of a defect center with activation energy of 120 meV. An Arrhenius function o f the PL emission intensity confirms that a nonradiative recombination chan nel becomes visible with an energy of about 120 meV. (C) 1999 Elsevier Scie nce B.V. All rights reserved.