InAs quantum dots grown in a GaAs matrix are investigated using capacitance
transient spectroscopy and transmission electron microscopy (TEM). Trap st
ates are measured which are associated with the presence of the quantum dot
s but are too deep to be interpreted as the intrinsic electronic levels of
the quantum dots. TEM allows us to rule out traps caused by threading dislo
cations in the GaAs matrix. The trap occupation measured from capture data
is a highly non-exponential function of the filling pulse duration and, tog
ether with double DLTS measurements, indicate that the traps are electrical
ly coupled in two dimensions and located in the plane of the dots. We propo
se that the measured deep levels are due to point defects in or near the qu
antum dots. (C) 1999 Elsevier Science B.V. All rights reserved.