Optical characterization of thin and ultrathin chromium films

Citation
Jm. Siqueiros et al., Optical characterization of thin and ultrathin chromium films, REV MEX FIS, 45(6), 1999, pp. 593-596
Citations number
23
Categorie Soggetti
Physics
Journal title
REVISTA MEXICANA DE FISICA
ISSN journal
0035001X → ACNP
Volume
45
Issue
6
Year of publication
1999
Pages
593 - 596
Database
ISI
SICI code
0035-001X(199912)45:6<593:OCOTAU>2.0.ZU;2-I
Abstract
Thin and ultrathin chromium films were grown on glass by thermal evaporatio n in vacuum of the order of 10(-4) Pa with the purpose of studying the char acteristics of these layers used as adhesion promoters in a number of appli cations. Ellipsometry is used to obtain the optical properties of chromium and chromium oxide as well as the equivalent ultrathin layer for films with thickness from a fraction to a few nanometers. Experimental measurements a nd theoretical modeling showed that the ultrathin films essentially consist of chromium/chromium oxide clusters with heights of the order of the measu red thickness as determined by a quartz microbalance indicating a Vollmer-W eber growth mechanism. Percolation was found for thickness above 30 nm.