Controlled molecular adsorption on silicon: Laying a foundation for molecular devices

Authors
Citation
Ra. Wolkow, Controlled molecular adsorption on silicon: Laying a foundation for molecular devices, ANN R PH CH, 50, 1999, pp. 413-441
Citations number
97
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
ANNUAL REVIEW OF PHYSICAL CHEMISTRY
ISSN journal
0066426X → ACNP
Volume
50
Year of publication
1999
Pages
413 - 441
Database
ISI
SICI code
0066-426X(1999)50:<413:CMAOSL>2.0.ZU;2-J
Abstract
This review is about understanding and controlling organic molecular adsorp tion on silicon. The goal is to provide a microscopic picture of structure and bonding in covalently attached molecule-silicon surface systems. The bi as here is that an unprecedented, detailed understanding of adsorbate-surfa ce structures is required in order to gain the control necessary to incorpo rate organic function into existing technologies or, eventually, to make ne w molecule-scale devices. A discussion of recent studies of adsorbate struc ture is presented. This includes simple alkenes, polyenes, benzene, and car ene adsorbed on Si(100). Also included is a discussion of wet chemical proc edures for forming alkyl and alkoxy covalently functionalized silicon. Thes e discussions are presented together with comments on the related issues of adsorption dynamics and nano-scale manipulation in an effort to point the way toward principles and procedures that will allow the hybrid properties of organic molecules and surfaces to be harnessed.