X-ray reflectivity has been used to measure nondestructively the density of
thin, porous, silica xerogels used for interlayer dielectric applications.
The critical angle, defined through total external reflection, was measure
d for multiple x-ray energies to correct for sample misalignment error in t
he determination of the density for the films. This density was used to ext
rapolate the percentage porosity, assuming a bulk SiO2 density standard. Th
e results were compared to those obtained by Rutherford backscattering and
ellipsometry techniques. (C) 2000 American Institute of Physics. [S0003-695
1(00)00702-6].