Comment on "Emission of prompt electrons during excimer laser ablation of aluminum targets" [Appl. Phys. Lett. 75, 7 (1999)]

Authors
Hong, MH Lu, YF
Citation
Mh. Hong et Yf. Lu, Comment on "Emission of prompt electrons during excimer laser ablation of aluminum targets" [Appl. Phys. Lett. 75, 7 (1999)], APPL PHYS L, 76(2), 2000, pp. 248-248
Citations number
2
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
76
Issue
2
Year of publication
2000
Pages
248 - 248
Database
ISI
SICI code
0003-6951(20000110)76:2<248:CO"OPE>2.0.ZU;2-T