The growth of vanadium oxide on alumina and titania single crystal surfaces

Citation
Rj. Madix et al., The growth of vanadium oxide on alumina and titania single crystal surfaces, FARADAY DIS, (114), 1999, pp. 67-84
Citations number
56
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
Faraday discussions
ISSN journal
13596640 → ACNP
Issue
114
Year of publication
1999
Pages
67 - 84
Database
ISI
SICI code
1359-6640(1999):114<67:TGOVOO>2.0.ZU;2-6
Abstract
Evaporation of vanadium metal onto alumina or titania surfaces at room temp erature in an oxygen ambient results in the growth of V2O3 overlayers. The results of several complementary methods, including STM, indicate that the oxide grows in clusters 20-30 Angstrom in diameter, eventually covering the surface with a granular thin film at a coverage in excess of one monolayer of vanadium atoms. The similarity of the distribution of vanadium metal an d the vanadium oxide on the surfaces observed by STM on a thin, crystalline alumina film suggests that the oxide is formed after the metal nucleates i nto small clusters. No surface reduction of cations occurs on either the Ti O2(110) or Al2O3(0001) surface when the vanadium oxide is formed. On the al umina, the vanadium oxide film appears to be conducting at room temperature , as would be expected for V2O3 formation.