Field induced trap assisted band-to-band tunneling in poly-silicon thin-fil
m transistors is studied using a two-dimensional model. Both the space depe
ndence and the effect of graded doping are investigated. A graded doping pr
ofile results in a moderate reduction in the current, while a much larger r
eduction is achieved by increasing the thickness of the gate oxide near the
drain region. In this way, the on/off ratio of the thin-film transistor sh
ould be greatly improved.