Characterization of sputtered TiNi shape memory alloy thin films

Citation
P. Surbled et al., Characterization of sputtered TiNi shape memory alloy thin films, JPN J A P 2, 38(12B), 1999, pp. L1547-L1549
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
38
Issue
12B
Year of publication
1999
Pages
L1547 - L1549
Database
ISI
SICI code
Abstract
The sputtering of TiNi polycrystalline alloys without and with a titanium m esh has been investigated for the development of shape memory alloy (SMA) m icro-actuators. The thickness and composition distributions of TiNi thin fi lms have been determined by Rutherford backscattering spectroscopy (RBS). T he composition of sputtered films was demonstrated to depend on the density of the titanium mesh and the distance from the target center, thus enablin g easy fabrication of high and low temperature SMA actuators. The transitio n temperatures and resistivity have been measured with respect to the compo sition.