Interactions in the Co-Ni-Si system at 800 degrees C

Citation
Ja. Van Beek et al., Interactions in the Co-Ni-Si system at 800 degrees C, J ALLOY COM, 297(1-2), 2000, pp. 137-143
Citations number
7
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF ALLOYS AND COMPOUNDS
ISSN journal
09258388 → ACNP
Volume
297
Issue
1-2
Year of publication
2000
Pages
137 - 143
Database
ISI
SICI code
0925-8388(20000202)297:1-2<137:IITCSA>2.0.ZU;2-#
Abstract
The isothermal cross-section through the ternary phase diagram Co-Ni-Si at 800 degrees C was constructed. No ternary phases exist in the system at thi s temperature. The topology of the Co-Ni-Si isotherm is determined by the f ormation of continuous solid solutions between isomorphous Co2Si and Ni2Si intermetallics and cubic CoSi2 and NiSi2 phases and by rather extensive cob alt/nickel exchanges in other binary silicides. The CoSi intermetallic comp ound was found to be a dominant growing phase in the binary Co/Si as well a s ternary Co-Ni/Si couples with the initial end-members containing up to 50 at.% Of Ni. When the Co-Ni solid solution with 30-70 at.% of nickel was us ed, the formation of NiSi2 and NiSi (instead of CoSi2) intermetallics next to the Si-substrate was observed after interaction at 800 degrees C. (C) 20 00 Elsevier Science S.A. All rights reserved.