Polytypism in epitaxially grown gallium nitride

Citation
H. Selke et al., Polytypism in epitaxially grown gallium nitride, J CRYST GR, 208(1-4), 2000, pp. 57-64
Citations number
12
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
208
Issue
1-4
Year of publication
2000
Pages
57 - 64
Database
ISI
SICI code
0022-0248(200001)208:1-4<57:PIEGGN>2.0.ZU;2-U
Abstract
Using electron and X-ray diffraction techniques as well as high-resolution transmission electron microscopy, a rhombohedral phase with the lattice par ameters a = 0.3183 nm and c = 2.338 nm has been identified in gallium nitri de (GaN) epilayers grown on sapphire by molecular beam epitaxy. A structura l model is proposed for the rhombohedral phase which corresponds to a seque nce of nine close-packed Ga-N bilayers stacked along the c-direction. Thus, the new phase can be interpreted as a long period 9R-GaN polytype. (C) 200 0 Elsevier Science B.V. All rights reserved.