GaAs film deposited on SrTiO3 substrate by molecular beam epitaxy

Citation
Qx. Zhao et al., GaAs film deposited on SrTiO3 substrate by molecular beam epitaxy, J CRYST GR, 208(1-4), 2000, pp. 117-122
Citations number
14
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
208
Issue
1-4
Year of publication
2000
Pages
117 - 122
Database
ISI
SICI code
0022-0248(200001)208:1-4<117:GFDOSS>2.0.ZU;2-X
Abstract
GaAs films grown on ferroelectric SrTiO3 substrates by molecular beam epita xy are characterized, to the best of our knowledge, for the first time by u sing photoluminescence (PL), scanning electron microscopy and secondary-ion mass spectrometry measurement techniques. The results show that under the current growth conditions the deposited GaAs material first forms 3D island s on the SrTiO3 substrates and then with further increase in deposition thi ckness of GaAs, a GaAs film with a very rough surface is formed. Optical tr ansitions close to GaAs band-gap energy are observed for both the thin and the relatively thick samples. The transition energy of the observed emissio n labeled as F in the PL spectra shows a significant blue shift in comparis on with the energy of the band-gap emissions in bulk GaAs. (C) 2000 Elsevie r Science B.V. All rights reserved.