MBE growth and X-ray study of high-quality cubic-GaN on GaAs(001)

Citation
Zq. Li et al., MBE growth and X-ray study of high-quality cubic-GaN on GaAs(001), J CRYST GR, 208(1-4), 2000, pp. 786-790
Citations number
23
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
208
Issue
1-4
Year of publication
2000
Pages
786 - 790
Database
ISI
SICI code
0022-0248(200001)208:1-4<786:MGAXSO>2.0.ZU;2-N
Abstract
High-quality cubic GaN epilayer on GaAs(0 0 1) was grown by molecular beam epitaxy equipped with radio frequency nitrogen source. The optimized growth condition is to grow two monolayers thick initial GaN at 600 degrees C und er As atmosphere. X-ray diffraction rocking curve shows that the full-width at half-maximum of cubic GaN(0 0 2) diffraction peak is 10 arcmin. The X-r ay reciprocal space mapping is used to identify the secondary hexagonal pha se and estimate their relative content. (C) 2000 Elsevier Science B.V. All rights reserved.